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Fabrication and MOS interface properties of ALD AlYO3/GeOx/Ge gate stacks with plasma post oxidation - ScienceDirect
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A very low temperature (170 °C) crystallization of amorphous-Ge thin film on glass via Au induced layer exchange process in amorphous-Ge/GeOx/Au/glass stack and electrical characterization - ScienceDirect
Remote Sensing | Free Full-Text | Geomorphological and Climatic Drivers of Thermokarst Lake Area Increase Trend (1999–2018) in the Kolyma Lowland Yedoma Region, North-Eastern Siberia
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Modeling and in Situ Probing of Surface Reactions in Atomic Layer Deposition | ACS Applied Materials & Interfaces
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Remote Oxygen Scavenging of the Interfacial Oxide Layer in Ferroelectric Hafnium–Zirconium Oxide-Based Metal–Oxide–Semiconductor Structures | ACS Applied Materials & Interfaces
Remote Oxygen Scavenging of the Interfacial Oxide Layer in Ferroelectric Hafnium–Zirconium Oxide-Based Metal–Oxide–Semiconductor Structures | ACS Applied Materials & Interfaces
Engineering High-k/SiGe Interface with ALD Oxide for Selective GeOx Reduction | ACS Applied Materials & Interfaces
Remote Oxygen Scavenging of the Interfacial Oxide Layer in Ferroelectric Hafnium–Zirconium Oxide-Based Metal–Oxide–Semiconductor Structures | ACS Applied Materials & Interfaces
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Insights into catalyst structure, kinetics and reaction mechanism during propane dehydrogenation on Pt-Ge bimetallic catalysts - ScienceDirect
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Understanding the Mechanism of Electronic Defect Suppression Enabled by Nonidealities in Atomic Layer Deposition | Journal of the American Chemical Society
